Positive Surface Modification Resist System.
نویسندگان
چکیده
منابع مشابه
Profile Measurement of Resist Surface Using Multi-Array-Probe System
Semiconductor processing in manufacturing must be fast and highly accurate in the measuring of the surface profile of soft thin films such as photoresist. Since photoresist surface is very smooth and deformable, a device to measure is required that will measure vertical direction with a nanometer resolution in height and not damage the film during the measurement. To do this, we developed an ap...
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• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website. • The final author version ...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 1999
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.12.669